We investigate optical properties of dislocations in nitrogen-doped and nitrogen-free Czochralski silicon. The dislocations are formed during crystal growth, but not formed during deformation. The results show that in nitrogen-doped samples, a broad band replaced the D1 band of dislocation, regardless of dislocation density. The replacement of D1 band is caused by the non-irradiation combination induced by oxygen precipitation. Moreover, a new emission at 0.975 eV is observed in both the nitrogen-free and doped samples when the dislocation density is lower than 10(4) cm(-2).

Li, D., Yang, D., Leoni, E., Binetti, S., Pizzini, S. (2004). Photoluminescence of dislocations in nitrogen doped Czochralski silicon. CHINESE PHYSICS LETTERS, 21(11), 2242-2244 [10.1088/0256-307X/21/11/046].

Photoluminescence of dislocations in nitrogen doped Czochralski silicon

BINETTI, SIMONA OLGA;PIZZINI, SERGIO
2004

Abstract

We investigate optical properties of dislocations in nitrogen-doped and nitrogen-free Czochralski silicon. The dislocations are formed during crystal growth, but not formed during deformation. The results show that in nitrogen-doped samples, a broad band replaced the D1 band of dislocation, regardless of dislocation density. The replacement of D1 band is caused by the non-irradiation combination induced by oxygen precipitation. Moreover, a new emission at 0.975 eV is observed in both the nitrogen-free and doped samples when the dislocation density is lower than 10(4) cm(-2).
Articolo in rivista - Articolo scientifico
nitrogen , silicon , dislocation
English
2004
21
11
2242
2244
none
Li, D., Yang, D., Leoni, E., Binetti, S., Pizzini, S. (2004). Photoluminescence of dislocations in nitrogen doped Czochralski silicon. CHINESE PHYSICS LETTERS, 21(11), 2242-2244 [10.1088/0256-307X/21/11/046].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/1161
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